Date: Wednesday 16 March 2016
Time: 11:00 - 12:30
Location / Room: Konferenz 6

Organiser:
Marco Casale-Rossi, Synopsys, US

Chair:
Marco Casale-Rossi, Synopsys, US

Co-Chair:
Giovanni De Micheli, École Polytechnique Fédérale de Lausanne (EPFL), CH

Ten years ago, at 90 nanometers EDA was challenged, and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers integration capacity has increased by two orders of magnitude, power consumption has been successfully "defeated", and 193 nanometer immersion lithography is still relied upon… *also* thanks to EDA; tools, methodologies, and flows that were originally devised for design enablement at the emerging technology nodes, have been successfully re-deployed at the established technology nodes, where they represent a critical design differentiation factor. However, the battleground is changing again: after the billions of phones, trillions of "things" lie ahead; moving forward, emerging and established technology nodes, digital and analog, hardware and software will be equally critical. What is EDA doing and, more important, what should EDA do - and is not doing - in order for the next decade to be as great as the past one? This panel session, moderated by EPFL Professor Giovanni De Micheli, gathers academia, semiconductor, and EDA industry to discuss the challenges and the requirements of the new era.

Download Paper (PDF; Only available from the DATE venue WiFi)

Moderator:

• Giovanni De Micheli, École Polytechnique Fédérale de Lausanne (EPFL), CH
  

Panelists:

• Antun Domic, Synopsys, US
  
• Enrico Macii, Politecnico di Torino, IT
  
• Domenico Rossi, STMicroelectronics, IT
  
• Joseph Sawicki, Mentor, US
  

12:30

End of session Lunch Break in Großer Saal + Saal 1 Keynote Lecture in "Saal 2" 14:00 - 14:30